SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

阅读量:

30

申请(专利)号:

WO2016JP77843

申请日期:

2016-09-21

公开/公告号:

WO2017134853A1

公开/公告日期:

2017-08-10

申请(专利权)人:

KOKUSAI ELECTRIC SEMICONDUCTOR SERVICE INC.;HITACHI KOKUSAI ELECTRIC INC.

发明人:

M HideyukiF Satoshi

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摘要:

The present invention has: a processing chamber in which a substrate held by a substrate holder is processed; and a preparation chamber in the interior of which a carrying mechanism for carrying the substrate holder into the processing chamber and a transfer mechanism for transferring the substrate holder to the carrying mechanism are disposed and that is configured to be capable of communicating with the processing chamber, wherein the transfer mechanism is configured to transfer one or multiple substrate holders holding substrates between a detachment position outside the preparation chamber at which the substrate holders are detached and a handover position inside the preparation chamber at which the substrate holders are transferred to the carrying mechanism.

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