SKIN LOTION FOR SKIN CLEANSING AND MOISTURIZING
申请(专利)号:
JP特願2000-83587(P2000-83587)
申请日期:
20000324
公开/公告号:
JP特開2001-270819(P2001-270819A)A
公开/公告日期:
20011002
申请(专利权)人:
YAMACHU:KK 株式会社山忠
摘要:
PROBLEM TO BE SOLVED: To solve such a problem that ethanol formulated in a conventional skin lotion irritates skin and causes inflammation such as rash, or the like, and to improve the situation that the formulating amount of a moisturizing agent excluding polyalcohols, an astringent, an emollient are trace and their effect are lost in a short time and the skin cleansing effect is not taken into account.
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