Compliant spray flux masks, systems, and methods
申请(专利)号:
11/612652
申请日期:
12/19/2006
公开/公告号:
US8308047
公开/公告日期:
11/13/2012
申请(专利权)人:
Intel Corporation (Santa Clara, CA, US)
被引量:
摘要:
A flux spray head, a mask, and an integrated circuit substrate are arranged in a flux spray station to reduce flux overspray during a spraying operation. A support element within the spray station is used to align the substrate with the mask and spray head. A portion of the mask contacts the substrate along a boundary between a region to be sprayed and a region to be masked. The flux spray head sprays the substrate while a portion of the mask is in contact with the boundary of the region to be masked. In an embodiment, the mask may comprise one or more replaceable non-stick stencil elements and associated springs to press the stencil elements against the substrate. Each stencil element may have a wall to contact the substrate along a portion of the boundary.
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