摘要：

In a gas deposition apparatus includes: an ultra fine particle evaporation chamber; an evaporation source arranged in the ultra fine particle evaporation chamber; a deposition chamber; a substrate arranged in the deposition chamber; a transfer pipe connecting the ultra fine particle evaporation chamber with the deposition chamber; an inlet port of the transfer pipe directly facing to the evaporation source in the ultra fine particle evaporation chamber and an outlet port of the transfer pipe being in the deposition chamber; a nozzle connected to the outlet port of the transfer pipe, facing to the substrate in the deposition chamber; and an introducing port for introducing inert gas into the ultra fine particle evaporation chamber wherein ultra fine particles evaporated from the evaporation source by heating the latter, are transported together with inert gas through the transfer pipe and they are ejected out from the nozzle onto the substrate to form a film or condensation of ultra fine particle thereon, a DC power source is connected to the transfer pipe and the seethe heater is wound on the nozzle.

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