摘要：

In the last years a variety of plasma sources have been developed for film deposition by plasma activated deposition techniques. In addition to RF- and DC-sources, pulsed plasma sources are gaining increased attention. This interest is driven by the wish of depositing coatings with superior properties as compared to those deposited by conven-tional techniques. One prominent example of coatings that are significantly enhanced by the usage of pulsed plasmas is alumina. Although crystalline a-alumina can be de-posited by thermal CVD at temperatures above 1000℃ for two decades, no process for the deposition of crystalline alumina on heat sensitive substrates like tempered steels at low temperatures is commercially available up to now. In this paper, the deposition of alumina films from gaseous mixtures of AlCl3-N2-H2-Ar in a bipolar pulsed glow discharge at about 500℃ is reported. Special attention was paid on the correlation be-tween plasma characteristics and film properties. The measurements revealed th

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