High speed process for coating substrates

阅读量:

22

申请(专利)号:

EP19890303754

申请日期:

1989-04-17

公开/公告号:

EP0340935A2

公开/公告日期:

1989-11-08

申请(专利权)人:

SPECTRUM CONTROL, INC. (A DELAWARE CORPORATION)

发明人:

Y AngeloH MooyoungDG ShawDS Strycker

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被引量:

304

摘要:

A high-speed process for coating substrates with thin organic coatings in a vacuum is disclosed and claimed. The process utilizes relatively low boiling, reactive monomers (e.g., polyacrylates) which are flash vaporized, condensed on the substrate and cured, in situ. The resultant cured films are pin-hole free and exhibit excellent adhesion. The process is capable of being run at very high coating and curing speeds, e.g., between 1 and 1000 cm/second.

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2001
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