The dependence of hardness on the density of amorphous alumina thin films by PECVD

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摘要：

Smooth, uniform and transparent aluminum oxide films were deposited at low temperature (≤ 500°C) by r.f. plasma enhanced chemical vapor deposition (PECVD) with AlCl 3 , H 2 and CO 2 as the reactants. The measurements of mechanical and optical properties demonstrate a potential application of PECVD aluminum oxide film as an optical protective coating. The variation of film hardness and density with deposition parameters is apparent and shows a similar dependence while the composition stoichiometry is not so influenced. For amorphous thin films incorporating hydrogen and/or microvoid with no apparent variation on composition stoichiometry, the film hardness is dominated by density and a function near linear can be constructed as energy density is taken into account as an apparent character of hardness.

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关键词：

Experimental/ alumina amorphous state corrosion protective coatings density dielectric thin films electron probe analysis Fourier transform spectra infrared spectra microhardness optical films plasma CVD coatings scanning electron microscopy stoichiometry transparency X-ray diffraction/ amorphous alumina thin films PECVD plasma enhanced chemical vapour deposition transparent optical protective coating film hardness density deposition parameters composition stoichiometry XRD X-ray diffraction EPMA electron probe microanalysis SEM scanning electron microscopy FTIR 300 to 500 C Al 2O 3/ A6855 Thin film growth, structure, and epitaxy A4278H Optical coatings A6220M Fatigue, brittleness, fracture, and cracks A6480E Stoichiometry and homogeneity A6480G Microstructure A6820 Solid surface structure A6825 Mechanical and acoustical properties of solid surfaces and interfaces A7755 Dielectric thin films A7820D Optical constants and parameters (condensed matter) A7865J Optical properties