Vapor deposition method and apparatus
申请(专利)号:
US65538457A
申请日期:
04/26/1957
公开/公告号:
US2971862
公开/公告日期:
02/14/1961
申请(专利权)人:
NAT RES CORP
被引量:
摘要:
1. A process for coating aluminum onto a heat-sensitive substrate, such as paper, which contains adsorbed and absorbed volatiles, which comprises the steps of exposing the substrate to a vacuum of between about 20 and about 290 microns Hg abs. for a period sufiicient to remove substantial quantities of entrapped gases, subsequently passing the substrate into and out of a coating chamber maintained at a pressure below about 20 microns Hg abs., exposing the front surface of the substrate to aluminum vapors While it is in the coating chamber, the concentration of aluminum vapors being sufficient to produce a coating having at least 70 percent reflectance, the substrate moving at such a rate that no unit area of the substrate is exposed to the high vacuum of the coating chamber for a period in excess of second, back surface of the substrate being held in contact with an impermeable surface moving at the.
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