摘要：

Technologies for processing inorganic compounds into high-definition products are used in many areas including thin-film transistors and liquid crystal displays. These technologies are based on the technology of depositing thin films of I μm or less in thickness using vacuum processes such as sputtering and vapor deposition. The present review compiles the results of research made on photosensitive paste technology for processing inorganic materials into high-definition thick films of several micrometers to less than 200 micrometers in thickness. The technology for processing inorganic materials into films of several micrometers to less than 200 micrometers in thickness is used for producing the electrodes and barrier ribs of plasma display panel (PDP), and is expected to widely spread into such areas as IC packages in the future.

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