Polyimide substrate and method of manufacturing a printed wiring board using the substrate
申请(专利)号:
US19920863512
申请日期:
1992-03-31
公开/公告号:
US5156732A
公开/公告日期:
1992-10-20
申请(专利权)人:
SUMITOMO METAL MINING CO. LTD.
被引量:
摘要:
Disclosed is a method of preparing a copper-polyimide substrate comprising applying an electroless copper plating to the surface of a polyimide resin, wherein the surface of a polyimide resin is first etched so as to form a hydrophilic denatured layer on the surface of the said polyimide resin and, after a catalyst is imparted to the substrate, the substrate is copper-plated and thereafter heat-treated at a temperature of 120° C. or higher thereby to modify the hydrophilic denatured layer to a heat-resistant copper-diffusion preventing layer. Also disclosed is a method of preparing a printed wiring board having the copper-polyimide substrate, comprising a first step of etching the surface of a polyimide resin substrate, a second step of applying a catalyst to the substrate followed by electroless plating thereof to give a copper-polyimide substrate, and a third step of forming a circuit on the thus prepared copper-polyimide substrate; which is characterized in that a hydrophilic denatured layer is formed on the surface of the polyimide resin by the etching of the first-step treatment, and the substrate is heat-treated at a temperature of 120° C. or higher after the copper-plating treatment of the second step or before the circuit- forming treatment of the third step to be effected by plating a conductive metal on the surface of the substrate by the use of a free cyan or cyan compound, whereby the hydrophilic denatured layer is modified into a heat-resistant copper-diffusion preventing layer. The metal plating layer has an excellent adhesion strength capable of withstanding thermal shocks. The substrate can be used for producing electronic parts having high reliability with stable operationability.
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