Chamber apparatus, extreme ultraviolet light generation system, and method for controlling the extreme ultraviolet light generation system

阅读量:

12

申请(专利)号:

US201213494466

申请日期:

2012-06-12

公开/公告号:

US2013026393A1

公开/公告日期:

2013-01-31

申请(专利权)人:

TOORU ABE;OSAMU WAKABAYASHI

发明人:

Tooru AbeOsamu Wakabayashi

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国省代号:

JP

摘要:

A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a first optical system and a second optical system. The chamber has an inlet for introducing a laser beam thereinto. The target supply unit supplies a target material to a region inside the chamber. The first optical system focuses the laser beam in the region. The guide beam output device outputs a guide beam. The second optical system directs the guide beam such that an axis of a beam path of the guide beam substantially coincides with an axis of a beam path of the laser beam and such that the guide beam enters the focusing optical system through the region.

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