Method of forming thin vapor deposited film of organic material
申请(专利)号:
US19830532817
申请日期:
1983-09-16
公开/公告号:
US4543275A
公开/公告日期:
1985-09-24
申请(专利权)人:
FUJI PHOTO FILM CO., LTD.
被引量:
摘要:
A process for forming a vapor-deposited thin layer of organic material is disclosed. The process involves placing organic material on a support base within a vacuum chamber and providing a heat source in the vicinity of the organic material. A second support base is then provided within the vacuum chamber and heat is applied to the organic material at a temperature which causes the organic material to form vapors. The vapors are vapor-deposited on the second support base forming the thin layer of organic material. It is generally desirable to move both of the support bases during the vapor deposition process allowing the formation of a continuous uniform thin layer of organic material.
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