Optical system for the automatic alignment of two motifs comprising alignment marks of the grating type, particularly in direct photorepetition on silicon

阅读量:

16

申请(专利)号:

US06/212585

申请日期:

19801203

公开/公告号:

US04402610A

公开/公告日期:

19830906

申请(专利权)人:

THOMSON-CSF

发明人:

M Lacombat

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被引量:

26

摘要:

Optical system for the automatic alignment of two motifs in which the alignment marks of a first fixed motif forming the reference are constituted by at least one pair of identical periodic optical gratings with a constant spacing P and having a predetermined distance d. sub.X from one another such that the equation d.sub.X =(n+&egr;) P is proved, n being an integer and &egr; a fraction of unity.< P>An optical modulator, for example electro-optical means incorporating a Pockels cell alternately illuminate with the timing of the high frequency control signals, the said gratings in windows, whose position can be regulated in accordance with a given axis. The image of these windows is projected onto gratings carried on a second moving support to be aligned and produces orders of diffraction. An optoelectronic detector detects a predetermined order of diffraction. The high frequency- modulated output signals are transmitted to control circuits for producing the automatic alignment.

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1988
被引量:4

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