Optical system for the automatic alignment of two motifs comprising alignment marks of the grating type, particularly in direct photorepetition on silicon
申请(专利)号:
US06/212585
申请日期:
19801203
公开/公告号:
US04402610A
公开/公告日期:
19830906
申请(专利权)人:
THOMSON-CSF
被引量:
摘要:
Optical system for the automatic alignment of two motifs in which the alignment marks of a first fixed motif forming the reference are constituted by at least one pair of identical periodic optical gratings with a constant spacing P and having a predetermined distance d. sub.X from one another such that the equation d.sub.X =(n+&egr;) P is proved, n being an integer and &egr; a fraction of unity.< P>An optical modulator, for example electro-optical means incorporating a Pockels cell alternately illuminate with the timing of the high frequency control signals, the said gratings in windows, whose position can be regulated in accordance with a given axis. The image of these windows is projected onto gratings carried on a second moving support to be aligned and produces orders of diffraction. An optoelectronic detector detects a predetermined order of diffraction. The high frequency- modulated output signals are transmitted to control circuits for producing the automatic alignment.
展开
通过文献互助平台发起求助,成功后即可免费获取论文全文。
相似文献
参考文献
引证文献
研究点推荐
引用走势
辅助模式
引用
文献可以批量引用啦~
欢迎点我试用!