SELF-CLEANING MECHANISM FOR CLEANING NOZZLE
申请(专利)号:
JP19970276765
申请日期:
1997-10-09
公开/公告号:
JPH11105986A
公开/公告日期:
1999-04-20
申请(专利权)人:
MORISHITA KIKAI SEISAKUSHO:KK
摘要:
PROBLEM TO BE SOLVED: To provide a self-cleaning mechanism of a nozzle with wide range of adaptability. SOLUTION: A rod 12 is fitted in a cylindrical case 10. A cylindrical shutter 14 is fitted liquid-tightly and set to slide in the axial direction in a large diameter hole 10b of the case 10. The rod 12 is also fitted liquid-tightly in a small diameter hole 14a of the shutter 14. A cleaning nozzle 16 is set on the lower end of a small diameter shaft section 12a of the rod 12. An annular channel is formed on the end side of a large diameter hole 14b of the shutter 14, and a seal member 28 is installed therein. A spring support 18 is set on the rod 12, and a spring 22 is provided between the spring support 18 and a side wall, 14a of the shutter 14, and a window section W is opened by positioning the shutter 14 upward. An air intake 10C is formed on the case 10, and air is introduced therefrom to move the shutter to the window W closing position in resistance to the force of the spring 22.
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