High speed process for coating substrates
申请(专利)号:
US19880188036
申请日期:
1988-04-29
公开/公告号:
US4842893A
公开/公告日期:
1989-06-27
申请(专利权)人:
SPECTRUM CONTROL, INC.
被引量:
摘要:
A high-speed process for coating substrates with thin organic coatings in a vacuum is disclosed and claimed. The process utilizes relatively low boiling, reactive monomers (e.g., polyacrylates) which are flash vaporized, condensed on the substrates and cured, in situ. The resultant cured films are pin-hole free and exhibit excellent adhesion. The process is capable of being run at very high coating and curing speeds, e.g., between 1 and 1000 cm/second.
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