Handbook of Chemical Vapor Deposition

来自 Elsevier

阅读量:

396

作者:

PIERSONO Hugh

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摘要:

A comprehensive overview of the principles, technology and application of chemical vapor deposition (CVD), an extremely versatile process which can be used to manufacture coatings, powders, fibers and monolithic components. It presents a clear, objective, systematic assessment of CVD, including an examination of the theory of CVD processes, descriptions of the major CVD chemicals and chemical reactions, and reviews CVD systems and equipment used in industrial production and RandD, stressing key sub-processes such as plasma, laser, and photon CVD. Annotation copyright by Book News, Inc., Portland, OR

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DOI:

10.1016/B978-081551432-9.50016-4

被引量:

511

年份:

1999

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