摘要：

A step-and-repeat type exposure apparatus includes an X-Y stage for moving stepwise a workpiece such as a wafer relative to a projection lens system so that images of a pattern of an original such as a reticle are transferred onto different areas on the wafer in sequence. After exposures of such areas of the wafer that are included in one of plural regions of the wafer, the position of the wafer relative to the X-Y stage is shifted. Then, exposures of the areas included in another region of the wafer are effected. In another aspect, the step-and-repeat exposures of the wafer are effected along a direction inclined to the moving directions of the X-Y stage.

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