摘要：

A method and electronic circuit arrangement for producing photomasks comprising repetitive patterns of any desired size regardless of the size of the image field of an optical projection system. According to the present method an orthogonal mask field is displaced to initial coordinates Xi, Yi relative to a fixed column and row coordinate system, a plurality of such mask fields, each having different repetitive patterns, are arranged on a photographic plate displaced relative to each other, such mask fields are then assembled into a complex pattern mask field. The present circuit arrangement comprises control signal generating means for controlling a tool such as an optical projection system as well as positioning means for said tool or for said photographic plate. The signal generating means include a spacing counter connected to preselector units adjustable for selecting said initial coordinates, said units being connected to logic circuit channels which identify the signals produced at the outputs of said preselector units to provide control signals for the optical projection system and for the positioning means.

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