MASK PATTERN PRINTING DEVICE
摘要：
In the mask pattern printing device disclosed an optical system forms an illuminating beam and directs the illuminating beam through a mask onto a photosensitive surface and thereby forms a reflected beam. An observation system for aligning the mask image with the photosensitive surface is composed of a polarizer, a delay for delaying the polarized light one-quarter wavelength, and an analyzer. The observation system locates the polarizer in the illuminating beam before it reaches the mask to polarize the beam passing through the mask and the delay between the mask and the surface while the analyzer protrudes into the reflected beam for observation. Preferably the observation system is capable of moving at least the analyzer and the polarizer into and out of the illuminating beam. The observation system eliminates harmful reflected light from the mask and observes only the reflected light from the photosensitive plate.
展开
DOI：
doi:US3853398 A
被引量：
通过文献互助平台发起求助，成功后即可免费获取论文全文。
相似文献
参考文献
引证文献
辅助模式
引用
文献可以批量引用啦~
欢迎点我试用！
