Mask alignment fixture
1. An alignment fixture for orienting geometric indicia on a mask with respect to a semi-conductor wafer comprising mask holding means, wafer holding means, reciprocable means urging said mask holding means and said wafer holding means t...
Szasz, Peter R.，Kulicke Jr., Frederick W.，S Albert - US
MASK PATTERN PRINTING DEVICE
In the mask pattern printing device disclosed an optical system forms an illuminating beam and directs the illuminating beam through a mask onto a photosen...
I Kano - US
Improved step-and-repeat projection alignment and exposure system
Photometric printing apparatus comprising: a holder for holding a first object;a holder for holding a second object;a light source unit disposed for selectively illuminating different portions of the first object;a projection lens, dispo...
EH Phillips，Johannsmeier Karl-Heinz - EP
Process for the double-sided exposure of a semiconductor or substrate plates, especially wafers, as well as apparatus for the purpose of parallel and rotational alignment of such a plate
The invention concerns a process for the two-sided exposure of a semiconductor or substrate plate, especially exposure of a wafer, through exposure masks which are arranged in plane parallel, parallel and rotational alignment to either s...
JEAN SCHMIDT
STEP AND REPEAT CAMERA WITH COMPUTER CONTROLLED FILM TABLE
The invention concerns a process for the two-sided exposure of a semiconductor or substrate plate, especially exposure of a wafer, through exposure masks which are arranged in plane parallel, parallel and rotational alignment to either s...
CHARLES FORT，SAMUEL A. HARRELL，HANS JAEGER，... - US
Optical projection apparatus
A unity magnification catoptric image-forming system and an illumination system on the one hand, and an object- and image-surface supporting means on the other hand, are arranged for relative movement to retain the object and image surfa...
HS Hemstreet，DA Markle，WH Newell，... - US
METHODS AND APPARATUS FOR PHOTO-OPTICAL MANUFACTURE OF SEMICONDUCTOR PRODUCTS
A microphoto pattern generator capable of reducing large scale artwork to finally reduced dimensions for single reduction, step-and-repeat printing on wafers or photosensitive plates. A reflection viewing system is provided for imaging t...
PE Chandler，RE Lewis，MD Wright - US
Step-and-repeat projection alignment and exposure system
An alignment and exposure system is provided with a main stage movable along orthogonal axes to position either a reference mark, aligned with one of those axes, or a semiconductive wafer directly beneath a projection lens. Another stage...
EH Phillips - US
Catadioptric projection printer
An improved projection printer prints a circuitry pattern from a reticle onto a wafer by using a mercury arc source, a beam splitter, and a focusing mirror. The beam splitter is a polarizing beam splitter, and a polarization altering mea...
BUZAWA; M. JOHN，MUNNERLYN; CHARLES R.
METHOD AND ELECTRONIC CIRCUIT ARRANGEMENT FOR PRODUCING PHOTOMASKS
A method and electronic circuit arrangement for producing photomasks comprising repetitive patterns of any desired size regardless of the size of the image field of an optical projection system. According to the present method an orthogo...
SPRINGER R，DRESCHER K，JAHN E - US
