Process for improved planarization of the passivation layers for semiconductor devices
A method of manufacturing an integrated circuit having a multilayer structure where the method includes the steps of depositing a thin layer of low temperature oxide (LTO) on top of conductors and then spinning and curing a thin layer of...
A Malazgirt，B Padmakumar，A Bhattacherjee - US
Step-and-repeat projection alignment and exposure system with auxiliary optical unit
A step-and-repeat alignment and exposure system is provided with an adjustable holder for holding a main reticle, a main optical unit including a projection lens for producing an image of the main reticle at an image plane, a stage movab...
KH Johannsmeier，EH Phillips，O Corporation - US
Step-and-repeat projection alignment and exposure system
A step-and-repeat alignment and exposure system is provided with an adjustable holder for holding a main reticle, a main optical unit including a projection lens for producing an image of the main reticle at an image plane, a stage movab...
Camera for microphotography
A microfilm camera is adapted for partial or overall exposure of a film format according to choice. The camera is provided with film transport mechanism comprising sprockets driven by a film transport motor which may be actuated by a tra...
AUST; GERT-RUDIGER，HAINY; SIEGFRIED，KORF; ERICH - US
Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems
Apparatus for projecting multiple images from a pair of reticles (117) to a photo-sensitive coated substrate (1) to produce large scale electronic devices (2). A pair of parallel and proximate optical systems (29) are used, the optical s...
Griffith L. Resor III，RA Mceachern，WC Schneider，... - US
Object positioning process and apparatus
Objects, such as a pattern mask and a photoresist coated substrate, are placed in translational and/or rotational alignment by a system in which a target on one object is successively aligned to two targets on the other object so that th...
K Karlson - US
Projection exposure apparatus
An exposure apparatus includes a projection optical system of a catadioptric type and an optical element disposed on a reciprocating light path of the projection optical system. The optical element is movable along an optical axis direct...
M Suzuki - US
Exposure method and exposure apparatus
The invention deals with an exposure apparatus which detects environmental conditions such as atmospheric pressure, temperature and humidity in which the exposure apparatus is placed, and which maintains the projected magnification const...
S Komoriya，H Nishizuka，S Nakagawa，... - US
Step-and-repeat projection alignment and exposure system
An alignment and exposure system is provided with a main stage movable along orthogonal axes to position either a reference mark, aligned with one of those axes, or a semiconductive wafer directly beneath a projection lens. Another stage...
EH Phillips - US
Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
An apparatus includes a plurality of projection optical systems, each including optical elements arranged in an optical path between a first plane and a second plane and forming a radiation pattern from the first plane onto an exposure f...
M Tanaka，K Kato，M Kato，... - US
