Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems

Apparatus for projecting multiple images from a pair of reticles (117) to a photo-sensitive coated substrate (1) to produce large scale electronic devices (2). A pair of parallel and proximate optical systems (29) are used, the optical s...

Griffith L. Resor III，RA Mceachern，WC Schneider，... - US

Step-and-repeat alignment and exposure system

An improved step and repeat alignment and exposure system for printing an image of a reticle onto a semiconductive wafer. A unit magnification catadioptric lens projects the reticle image onto the semiconductive wafer, and includes prism...

EH Phillips - US

Bore-sighted step-and-repeat projection alignment and exposure system

A projection lens and a source of exposure light are employed for projecting an image of a reticle onto a first reference mark or a semiconductive wafer, both of which are movably supported in the image plane of the projection lens. Opt...

EH Phillips - US

Step-and-repeat projection alignment and exposure system

A projection lens and a source of exposure light are employed for projecting an image of a reticle onto a first reference mark or a semiconductive wafer, both of which are movably supported in the image plane of the projection lens. Opt...

Method and apparatus for coating a selected area of the surface of an object

Selected areas of the surface of a substrate, such as the surface of a substrate of single crystalline silicon having at least one CCD image sensor along a...

ZM Andrevski

Step-and-repeat projection alignment and exposure system with auxiliary optical unit

A step-and-repeat alignment and exposure system is provided with an adjustable holder for holding a main reticle, a main optical unit including a projection lens for producing an image of the main reticle at an image plane, a stage movab...

KH Johannsmeier，EH Phillips，O Corporation - US

Method and apparatus for processing a plate-like workpiece

A step-and-repeat type exposure apparatus includes an X-Y stage for moving stepwise a workpiece such as a wafer relative to a projection lens system so that images of a pattern of an original such as a reticle are transferred onto differ...

M Kosugi，Y Tokuda

STEP-AND-REPEAT PROJECTION ALIGNMENT AND EXPOSURE SYSTEM WITH AUXILIARY OPTICAL UNIT

A step-and-repeat alignment and exposure system is provided with an adjustable holder for holding a main reticle, a main optical unit including a projection lens for producing an image of the main reticle at an image plane, a stage movab...

KH Johannsmeier，EH Phillips - US

Pattern detector

A pattern detector for precise position measurement of a wafer, used in a mask aligner used in manufacturing a semiconductor device is disclosed. A positioning pattern on the wafer is magnified and projected by a magnifying optical syste...

S Kuniyoshi，T Terasawa，T Kurosaki，... - US

Frontal illumination system for semiconductive wafers

of the Disclosure A projection lens is disposed directly above a vacuum chuck for projecting an image of an illuminated portion of a semiconductive wafer held thereby to an image plane where that image may be viewed through a pair of obj...

EH Phillips - CA